The iSE spectroscopic ellipsometer from J.A. Woollam is designed specifically for real-time in-situ characterization of layers. It is used, for example, to characterize the growth kinetics of thin films in vacuum chambers. It enables, among other things, the determination of the optical properties of materials such as the complex refractive index, but also the determination of the thickness of the layers.
The iSE with Dual-Rotation technology measures the optical properties of thin films during growth with sub-angstrom sensitivity in a fraction of a second. Fast and accurate detection is provided by a CCD detector that allows the entire spectrum (in the 400-1000 nm range) to be measured simultaneously. iSE's ellipsometer is suitable for measuring a wide range of materials, including metals, semiconductors, oxides, nitrides and more.
Key Features
- In-situ configuration with easy integration onto the chamber
- Compact design
- Affordable price
- Fast, accurate, non-destructive measurement of the entire spectrum simultaneously
- Real-time monitoring of layer growth kinetics
- Suitable for a wide range of materials
