Microwriter ML3 Baby Plus Dual-Wave Laser Lithograph

The assembly enables the writing of high-resolution structures with the possibility of writing on large areas and several (even sub-millimeter) fragments simultaneously.

Possibility to write multiple structures with precise alignment (< 0.5 µm).

Dual 365 nm and 405 nm illumination source with automatic switching according to photoresist.

Stable system for time-consuming, large-area, high-resolution writing.

• Micro-contacting with precise alignment (< 500 nm)
• Fast, large-area writing (up to 150 mm x 150 mm)
• High resolution: 600 nm
• Grayscale recording

In November 2021, we installed the Microwriter ML3 Baby+ Dual-Wave from the British manufacturer Durham Magneto Optics Ltd. (DMO) for the Institute of Instrumentation, CAS.

This is a selectable 0.6 µm and 5 µm resolution assembly with the option of further expansion and a high-precision positioning system with a medium writing range (150 mm x 150 mm).

The dual illumination source is a novel feature for optimal writing to a wide range of photoresists (g-, h-, i-line and broadband photoresists). It is designed using two illumination units (powerful narrowband LEDs: 365 nm and 405 nm) with automatic switching according to user needs.

The integrated profilometer function allows, among others, verification of the write after structure development.

Writing even in grayscale is possible while maintaining a high speed of area writing and in 256 intensity levels.

Device parameters

• Source wavelength: 365 nm + 405 nm
• Writing resolution: 600 nm, 5000 nm
• Number of lenses: 2 (3x to 20x magnification) with the possibility of future expansion and digital zoom.

Additional features: wide field viewer, integrated profilometer, autofocus, focus lock, virtual rotation, auto sample centering, auto edge detection, auto marker recognition