Microwriter ML3 Pro from British manufacturer Durham Magneto Optics Ltd. (DMO) on the anti-vibration table CleanBench from American TMC.
It is a selectable resolution assembly (from 600 nm to 5 um), with a high-precision positioning system with interferometric metering, full optical autofocus and temperature stabilization.
The 385 nm wavelength illumination source with high optical performance and long lifetime allows writing to conventional g-line and h-line photoresist, as well as the popular SU-8 i-line photoresist.
Temperature stabilization ensures maximum stability even for longer write jobs.
The integrated profilometer function allows, among other things, verification of the write after structure development.
The Virtual Mask Aligner (VMA) function for precise alignment of the write to existing structures serves for accurate and easy micro-contacting. Grayscale enrollment is possible.
Device parameters
- Source wavelength: 385 nm
- Temperature stabilization: ± 0.25 °C
- Write resolution: 600 nm, 1000 nm, 2000 nm and 5000 nm
- Number of lenses: 4 (3x to 20x magnification + digital zoom)
- Additional features: VMA, wide field viewer, integrated profilometer, autofocus, focus lock, virtual rotation, auto sample centering, auto edge detection
