In August 2017, we installed an optical lithography system with direct writing to photoresist, the MicroWriter ML3 Baby Plus model, at the University of Chemical Technology in Prague.
The MicroWriter is a flexible photolithography system designed primarily for prototyping, research, development and low volume production purposes. The lithographic process involves the interaction of a narrow, high-intensity light beam moving across the sample surface with a photoresist layer. Subsequently, the print is developed and possibly further modified (for example, by sputtering a metal layer).
The installed version of the MicroWriter ML3 Baby Plus works with a 385 nm wavelength radiation source, which allows writing to a wide range of photoresists (g-, h-, i-line including e.g. SU-8).
The system can achieve resolutions up to 1 µm with the option to upgrade to 0.6 µm.
The main advantages of the device include high writing speed, large working area, integrated profilometer function and the ability to make corrections for height irregularities before actual writing. Users will also appreciate the ease of use, the ability to write in "grayscale" to create 3D structures, and optionally the ability to visualize the structure on a live image of the sample prior to actual writing for accurate alignment to an existing structure (Virtual Mask Aligner tool).
Parameters
- Substrate size: up to 230 mm x 230 mm x 15 mm (no lower limit)
- Maximum writable area: 149 mm x 149 mm (expandable to 195 mm x 195 mm)
- Achievable resolution: 1 µm, 5 µm (expandable to 0.6 µm and 2 µm)
- Available wavelengths: 385 nm (standard 405 nm)
- Write speed: 20 mm2/min at 1 µm, 120 mm2/min at 5 µm
